http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201023259-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
filingDate 2009-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2c572a9fc46a890ff2ed5259a49fd70
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48cfc2ee567d4bc6deb81e8d5745616b
publicationDate 2010-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201023259-A
titleOfInvention Abrasive, polishing method, method for manufacturing semiconductor integrated circuit device
abstract Provided is a polishing method for polishing a surface to be polished which includes a polysilicon film having a silicon dioxide film directly below, in manufacture of a semiconductor integrated circuit device. The polishing method includes a first polishing step wherein the polysilicon film is polished and planarized by using a first abrasive containing cerium oxide particles, water, and acid, and a second polishing step wherein the polysilicon film planarized in the first polishing step is polished by a second abrasive which contains at least cerium oxide particles, water, acid, and water-soluble polyamine or salt thereof, and the polishing is stopped when the silicon dioxide film is exposed.
priorityDate 2008-11-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393344
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID21885397
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419520344
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419572531
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID154306234
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82764
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID36610
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707642
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID410485865
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419964171
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450404263
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449310310
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID85102
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID1130
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19990
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82848
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID20239
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6326954
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419586922
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23056
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25378
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453715328
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453092551
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID54600979
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523132
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419547247
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID91234
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419551021
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415789626
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14796
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419525060
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID36610
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9543525
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID432364757
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393110

Total number of triples: 57.