http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201015738-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc905cbef116a1ec61d12125af9427f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45544 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-18 |
| filingDate | 2008-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e6c35e231f207036d0423db45bb56ac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59d52e9fa85dd3baf49c2237462730bc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccc67cef368f11c90fe5fee58d1155d3 |
| publicationDate | 2010-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201015738-A |
| titleOfInvention | Atomic layer deposition apparatus |
| abstract | An atomic layer deposition apparatus is provided. The atomic layer deposition apparatus includes a reaction chamber, a first heater, a second heater, a first gas supply system, a second gas supply system and a vacuum system. The vacuum system is connected to the reaction chamber. The reaction chamber includes a preheating chamber and a plating chamber connected to the preheating chamber. The first heater is for heating the preheating chamber. The first gas supply system is connected to the preheating chamber. The second heater is for heating the plating chamber. The second gas supply system is connected to the plating chamber. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103946418-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I555874-B |
| priorityDate | 2008-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 20.