| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f7a85d730847339e0c2e621c6c6fd96e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-003 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-00 |
| filingDate |
2009-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_55e141246e789d4e4f0d0a526d200fa8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db2f647e31dd7476252641f1fb0343be
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a9ff9ca2c7f0ee4c0324700eb3b9bde5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2a2efcdcd695024fb1a6e1ac962f7e27 |
| publicationDate |
2010-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201014924-A |
| titleOfInvention |
Hafnium and zirconium pyrrolyl-based organometallic precursors and use thereof for preparing dielectric thin films |
| abstract |
Hafnium and zirconium pyrrolyl-based organometallic precursors and methods of use thereof are provided to prepare metal-containing dielectric thin films by a vapor deposition process. The organometallic precursors correspond in structure to Formula I or dimers of Formula I: [(R)nPy]M(L)3 (Formula I) wherein: R is independently selected from the group consisting of alkyl, alkoxy and NR1R2; R1 and R2 are each independently hydrogen or alkyl; n is zero, 1, 2, 3 or 4; Py is pyrrolyl; M is Hf or Zr; L is selected from the group consisting of alkyl, alkoxy and NR1R2. |
| priorityDate |
2008-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |