| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14627
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48227
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-48091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14645
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-3025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14689
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-73265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2224-32225 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14632
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14685
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L27-14618 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-14 |
| filingDate |
2009-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ffddaee137048b266d7308ac8d45de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a2aa982c168ba61627bcb3ff736caef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e8144984f6b79d36680b44749c3e12b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ce8d1fcb16d23719f959413b06f8082 |
| publicationDate |
2010-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201010065-A |
| titleOfInvention |
Methods for forming anti-reflection structures for CMOS image sensors |
| abstract |
Protuberances, having vertical and lateral dimensions less than the wavelength range of lights detectable by a photodiode, are formed at an optical interface between two layers having different refractive indices. The protuberances may be formed by employing self assembling block copolymers that form an array of sublithographic features of a first polymeric block component within a matrix of a second polymeric block component. The pattern of the polymeric block component is transferred into a first optical layer to form an array of nanoscale protuberances. Alternately, conventional lithography may be employed to form protuberances having dimensions less than the wavelength of light. A second optical layer is formed directly on the protuberances of the first optical layer. The interface between the first and second optical layers has a graded refractive index, and provides high transmission of light with little reflection. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102468315-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11380617-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102468315-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I506771-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I492382-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I751867-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109920843-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113614582-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9911694-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I610365-B |
| priorityDate |
2008-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |