Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7995660796c354a2881371a7406bf6dd |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-582 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-156 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C19-045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-25 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C21-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F14-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B7-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C19-045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-00 |
filingDate |
2009-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8446e67ee9449e706172432286fdf04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56db438414868d5a56438fa532704031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_40c1b3f8c47dfc3ad8f021b51dbc0ca4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_128a15c22d768fc53eab6e81e3a0d975 |
publicationDate |
2010-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201004900-A |
titleOfInvention |
Process for the manufacture of at least one ethylene derivative compound |
abstract |
Process for the manufacture of at least one ethylene derivative compound starting from a low value residual gas, preferably a ROG, according to which: (a) the low value residual gas is subjected to a series of treatment steps in a low value residual gas recovery unit in order to remove the undesirable components present therein and to obtain a mixture of products containing ethylene and other constituents; (b) the said mixture of products is fractionated in one fractionation step into one fraction containing almost all the ethylene (fraction A), optionally into one individual fraction of ethane and into one heavy fraction (fraction C); and (c) fraction A is conveyed to the manufacture of at least one ethylene derivative compound. |
priorityDate |
2008-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |