http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201003348-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1699e3503680214e874e57ffe561d889 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G05D21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67075 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G05D21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-20 |
| filingDate | 2009-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_84064d67c282dcf57d32dc3fbad7abd6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d09e5d6e41d43c2f5c25697b47a0c16 |
| publicationDate | 2010-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201003348-A |
| titleOfInvention | Apparatus for mixing etching solution and apparatus for testing the concentration of etching solution |
| abstract | The present invention is to provide to the user side of semiconductor manufacture factory or flat panel display manufacture factory, an apparatus for mixing the etching solution of aluminum with specific concentrations of nitric acid, water, phosphoric acid and acetic acid. The solution means of the present invention comprises: an electric conductivity meter for measuring the electric conductivity of the diluted solution of etching solution in the pure water dilution tank, or a light absorption meter for measuring the nitric acid concentration in the etching solution, and a light absorption meter for measuring the water concentration in the etching solution, and a light absorption meter or density meter for measuring the concentration phosphoric acid in the etching solution, and from the detected value of electric conductivity of the electric conductivity meter for nitric acid concentration and the detected light absorption value of light absorption meter for water concentration and the detected light absorption value of light absorption meter or the density value of density meter for phosphoric acid concentration, using a multi-component calculation algorithm to calculate the concentration of the etching solution, and a solution supply means for at least one of the single acid, mixed acid and pure water. |
| priorityDate | 2008-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 47.