http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201001079-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-388 |
| filingDate | 2009-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c6dedb2bfd6b34c51908678e6ad554b2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d59fc16c05232a51ae619b9c701f003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ace0854343ed3077799e5f0d633b11a0 |
| publicationDate | 2010-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201001079-A |
| titleOfInvention | Resist underlayer film forming composition containing silicone having cyclic amino group |
| abstract | Disclosed is a composition for forming a resist underlayer film for lithography, which is used for forming a resist underlayer film that can be used as a hardmask. Specifically disclosed is a composition for forming a resist underlayer film for lithography, which contains a hydrolyzable organosilane, a hydrolysis product thereof or a hydrolysis-condensation product thereof as a silane. In the composition, a silane having a cyclic amino group is contained in an amount of less than 1% by mole, preferably in an amount of 0.01-0.95% by mole relative to the total silanes. Also specifically disclosed is a film-forming composition containing a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof or a hydrolysis-condensation product thereof. Further specifically disclosed is a composition for forming a resist underlayer film for lithography, which contains a hydrolyzable organosilane having a cyclic amino group, a hydrolysis product thereof or a hydrolysis-condensation product thereof. The cyclic amino group is a secondary amino group or a tertiary amino group. The hydrolyzable organosilane is represented by Formula (1). R1 aR2bSi(R3)4-(a+b) (1). [In the formular, R1 represents a cyclic amino group or an organic group containing a cyclic amino group.] |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I575324-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I514084-B |
| priorityDate | 2008-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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