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publicationDate 2010-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201001060-A
titleOfInvention Photo mask blank, photo mask and manufacturing method for photo mask blank
abstract Provided is a photo mask blank for manufacturing a photo mask suitable for ArF excimer laser, which has a film of multilayer structure on a light-transmissive substrate, and the toppest of the said film is an amorphous structure consisted of a material comprising at least one of chrom, nitrogen, oxygen and carbon.
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