| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_129e393582e6bdf4029baf2206522f45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24D3-22 |
| filingDate |
2009-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_956542e9a6bd2043c4e9de55924cddb2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3c36e2ec85e1a1af2c2ff7ab61d4038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1908fe2dde0206572333f7a8b5e99266
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2f579b5d228497751385dc39b63560f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ebdefe4b67d949d56a03b6a52d338ef5 |
| publicationDate |
2010-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201000262-A |
| titleOfInvention |
Polishing pad |
| abstract |
It is provided a polishing pad made of laminate of polishing layer and cushion layer. The micro rubber hardness of the said polishing layer is 75 DEG or more and the thickness is from 0.05mm to 1.5mm. On the surface of the said polishing layer, at least 2 kinds of groove groups are formed. The one of the said 2 kinds of groove groups is first groove group and the other is second groove group. The width of each groove in the first groove group is from 0.5mm to 1.2mm and each pitch between grooves is from 7.5mm to 50mm. The width of each groove in the second groove group is from 1.5mm to 3mm and each pitch between grooves is from 20mm to 50mm. And each groove of the said first groove group and each groove of the said second groove group are open toward to the side terminal face of the said polishing layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9682457-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I556910-B |
| priorityDate |
2008-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |