| abstract |
Disclosed is a composition for forming a resist underlying film for lithography, which is used for forming a resist underlying film that can be used as a hardmask. Specifically disclosed is a composition for forming a resist underlying film for lithography, which contains a hydrolyzable organosilane containing a urea group, a hydrolysis product thereof or a hydrolysis-condensation product thereof. The hydrolyzable organosilane is represented by Formula (1). [In Formula (1), at least one of T1, T2 and T3 represents a group which is represented by Formula (2).] |