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publicationDate 2009-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200940748-A
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abstract Methods for etching nickel and nickel alloy layers are disclosed. The etching compositions include inorganic acids and heterocyclic nitrogen compounds. Additionally, the etching methods may include anodic etching of nickel or nickel alloy layer. The methods may be used in semiconductor packaging manufacture.
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