| abstract |
The object of the present invention is through reducing the coating amount of a composition for forming anti-surface-reflection film to decrease the quantity of waste liquid, and thereby not only prevention of bad influences on environment but also cost reduction at the time of forming resist pattern are achieved. The solution of the present invention provides a composition for anti-surface-reflection film comprising at least one of a fluorine-containing compound, quaternary ammonium compound represented by following formula (I) (in the formula, at least one of R1, R2, R3 and R4 represents an alkanol group and others represent hydrogen atom or an alkyl group having 1 to 10 carbon atoms, X' represents hydroxyl group, an ion of halide, sulfate ion), and optionally a water-soluble polymer, an acid, a surfactant, an aqueous solvent. |