Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_de498babb0c04a00ceb653738877b147 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-235 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-5419 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-12044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-296 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
filingDate |
2008-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c970d9ecddb35c551287eede7cf9d22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_284b50dcb0552d9e6fad953246a2be33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c7322eac914babfe7a5b531e17287844 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fa0ffefbb13de953d81e65f877afc7e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_045ff57e3207060cc4e7e91e57266a2a |
publicationDate |
2009-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-200937121-A |
titleOfInvention |
Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist |
abstract |
Disclosed is a positive photosensitive composition which enables to obtain an insulating layer having not only high transparency but also heat resistance sufficient for withstanding the temperature at the time of substrate production, solvent resistance and excellent resistance to change over time as a permanent resist. Also disclosed are a positive permanent resist using such a positive photosensitive composition, and a method for producing a positive permanent resist. Specifically disclosed is a positive photosensitive composition containing a curable silicone resin (A) having a silanol group and a structure obtained by reacting one or more cyclic siloxane compounds represented by the general formula (1) below with one or more arylalkoxysilane compounds represented by the general formula (2) below, a diazonaphthoquinone (B) and a solvent (C). Also specifically disclosed are a positive permanent resist using such a positive photosensitive composition, and a method for producing a positive permanent resist. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I556062-B |
priorityDate |
2007-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |