http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200929592-A

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filingDate 2007-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_59202aacc55b8c339144110fa9bf7588
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publicationDate 2009-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200929592-A
titleOfInvention Method of growing nitride semiconductor material
abstract Provided is a method of growing nitride semiconductor material and particularly a method of growing Indium nitride is disclosed. The method can increase surface flatness of a nitride semiconductor material and decrease density of V-defects therein. Further, the method can increase light emission efficiency of a quantum well or quantum dots of the produced LED as well as greatly increase yield. The method is also applicable to the fabrications of electronic devices made of nitride semiconductor material and diodes of high breakdown voltage for rectification. The method can greatly increase surface flatness of semiconductor material for HBT, thereby increasing quality of the produced semiconductor devices.
priorityDate 2007-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 46.