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filingDate 2007-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200926445-A
titleOfInvention Fabricating method of photoelectric device and packaging structure thereof
abstract This invention discloses a fabrication method of photoelectric device. Firstly, a ceramic substrate is provided, a first patterned electrode layer and a second patterned electrode layer are respectively formed on the upper surface and lower surface on that ceramic substrate. Through the connection methods of solder wire or co-molten alloy, the electricity of pularity of photoelectric transistor grain is respectively connected to the first electrode layer. The surfaces of all light-emitting electric transistor grain are covered by encapsulation body for protecting that photoelectric transistor grain without being damaged by external forces or environment. Along the gap between adjacent photoelectric transistor grains, that ceramic substrate is cut to form pularity of independent packaging units.
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