http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200925268-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_996bb3be43c030355e9c3515c5fc4f08 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-3218 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-04 |
| filingDate | 2008-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c4f15ed5bf25aef22445b3d908e5210 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f0e80ef63ce3d09c19705e4f814ef24 |
| publicationDate | 2009-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200925268-A |
| titleOfInvention | Fluoride-containing photoresist stripper or residue removing cleaning compositions containing conjugate oligomeric or polymeric material of alpha-hydroxycarbonyl compound/amine or ammonia reaction |
| abstract | Semi-aqueous microelectronics cleaning formulations containing: (a) at least one fluoride compound providing fluoride ions, (b) at least one "browned" alpha-hydroxycarbonyl compound that is a oligomeric or polymeric conjugate of a alpha-hydroxycarbonyl compound with an amine or an ammonium compound, and (c) water. Such formulations may also comprise other optional components, including (d) at least one polar, water miscible organic solvent, (e) at least one metal ion-free base at sufficient amounts to produce a final composition of pH, 7 or above, preferably a pH of about 9.5 to about 10.8, and one or more of (f) a polyhydric alcohol and (g) a surfactant. Such compositions are useful to clean microelectronic devices without any significant corrosion of the metal and is compatible with ILDs. |
| priorityDate | 2007-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 186.