http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200923580-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ead90443277482e25bf91bfddef2b5a7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F22-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2008-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33d8f43a61118e1d546e29ada8a2b5c7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_799ed2856a5a9c42d2c3fdd2fd74a9ae http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_65f70aaaf21b287809fa7a48290e2c39 |
| publicationDate | 2009-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200923580-A |
| titleOfInvention | Photosensitive resin composition for black resist containing multifunctional thiol compound, black matrix for color filter using the same, and color filter |
| abstract | Provided is a photosensitive resin composition for black resist containing the following (A) to (E) components as essential components: (A) alkali-solvable resin, (B) photo-polymerizable monomer having at least one ethylene unsaturated bond, (C) photo-polymerization starter, (D) multifunctional thiol compound represented by the following formula (I), (provided that R1 represents alkyl group, R2 represents n-valent aliphatic group which may contains atoms other than carbon, R0 represents alkyl group which is not H, n represents 2 to 4) (E) at least one coloring material selected from black organic pigment, minded-color organic pigment and light-shielding material, wherein the weight ratio of (A) component to (B) component is 60/40 to 90/10, and the content of (C) component is 5 to 50 weight parts with respect to 100 weight parts of (A) component and (B) component in total. Thereby, the present invention provides a photosensitive resin composition for black resist having high sensitivity, good pattern adhesiveness and excellent preservation stability even in highly light-shielding field. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I740942-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I463262-B |
| priorityDate | 2007-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 213.