http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200922947-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d68514a32e3a53b7a0c77aabb87304b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c75a57c3359f361db66b025dad577ea1 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2007-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6ad21fd12050f32f76ac79922470a8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5207261bf8c755f8e86b38b244484d80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_677ec9717893381cc492c8cab11043f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4eede74bd1bbf3b449bec72021055432 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0e367c97af8c97c4629daab51680577 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd508e417d9751612c4cc840b335da20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ff7fd4ee816dc0e6f637ff4c467fc27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe0c2fc28b9d51905767225ab5be28d4 |
| publicationDate | 2009-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200922947-A |
| titleOfInvention | Photosensitive resin and photosensitive composition |
| abstract | Provided is a photosensitive resin and photosensitive composition capable of obtaining well-formed pattern, without accompanying with a problem of an acid-generating agent being difficult to be compatible with a polymer having an acidic dissociation group which is a main component of photo-resist. The photosensitive resin according to the present invention includes a repeated unit represented by the following formula (1), at least one of a repeated unit represented by the following formula (2) and a repeated unit represented by the following formula (3), and a repeated unit represented by the following formula (4), and may further include a repeated unit represented by the following formula (5) if required. (in the formula (1), R1 represents C2 to 9 linear or branched bivalent hydrocarbon group, R2 to R5 respectively independently represent hydrogen atom or C1 to 3 linear or branched hydrocarbon group, R6 and R7 respectively independently represent organic group, R6 and R7 may form a bivalent organic group together. X- represents anion.) (in the formula (2), R8 represents C2 to 9 linear or branched bivalent hydrocarbon group.) |
| priorityDate | 2006-05-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 112.