http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200918242-A

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filingDate 2008-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e94a0d6f75130f4516296993b0deac12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a905288e0a3dd59ac8063a93b626ac8
publicationDate 2009-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200918242-A
titleOfInvention Polishing pad
abstract Provided is a polishing pad for improving planarity by suppressing scratches and roll off on an object to be polished. A polishing pad (1) is provided with a polyurethane sheet (2) having a polishing surface (P) for polishing the object to be polished, and an elastic sheet (3) which is bonded on the opposite surface to the polishing surface (P) and has elasticity. The polyurethane sheet (2) has a compressibility set higher than that of the elastic sheet (3), and JIS-A hardness at 90 degrees or less. Both the polyurethane sheet (2) and the elastic sheet (3) are formed to have a thickness of 0.2mm or more. When the object to be polished is being polished, flexibility of the polyurethane sheet (2) works, and the polishing surface (P) is pressed to the object to be polished substantially uniformly while the polyurethane sheet (2) is being deformed.
priorityDate 2007-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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