| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_515262dca048e434990a1670088a10fa |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2008-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2f9f0ea91e48e2c2324261fc194d6dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9195e44a740a37ae13e5232c251046db
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa403da849f010ee057e2d660b1d676
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a040b6cc5fd19d9d0321b246595d08b3 |
| publicationDate |
2009-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200916966-A |
| titleOfInvention |
Silicon-containing composition for fine pattern formation and method for fine pattern formation using the same |
| abstract |
There are provided a composition for forming fine patterns with high resistance to dry etching, and a method of forming the said fine patterns. There are a composition for forming fine patterns, which comprises a resin formed by containing repeated units with silazane bond and solvents, and a method of forming fine patterns by using the said composition. |
| priorityDate |
2007-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |