http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200915436-A

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filingDate 2008-08-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200915436-A
titleOfInvention Formation of shallow junctions by diffusion from a dielectric doped by cluster or molecular ion beams
abstract A process for forming diffused region less than 20 nanometers deep with an average doping dose above 1014 cm 2 in an IC (100) substrate (102), particularly LDD region in an MOS transistor (106), is disclosed. Dopants are implanted into a source dielectric layer using gas cluster ion beam (GCIB) implantation, molecular ion implantation or atomic ion implantation resulting in negligible damage in the IC substrate. A spike anneal or a laser anneal diffuses the implanted dopants into the IC substrate. The inventive process may also be applied to forming source and drain (S/D) regions. One source dielectric layer (116) may be used for forming both NLDD and PLDD regions.
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