http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200915433-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-02162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-101
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-022416
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-328
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L31-105
filingDate 2008-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af827c722c35b55452e56592c016fc92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_daf3f51f3a3d769d7a9553fb693ac9ae
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8aa34cc5127b43df3c2688a4277fbc4f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10c6c1c7b9ee67180992effc6ec65ef7
publicationDate 2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200915433-A
titleOfInvention Semiconductor photodetector and manufacturing method thereof
abstract A method for manufacturing a semiconductor photodetector includes: an insulating film forming step of forming an insulating film on a semiconductor; an electrode forming step of forming an electrode on and in contact with a predetermined area of a surface of the semiconductor; an insulating film-protecting resist-forming step of forming a resist on the insulating film after the electrode forming step; a power supply layer forming step of forming a power supply layer of a metal on the resist and the electrode; a plating step of plating a surface of a portion of the power supply layer with a metal coating after the power supply layer forming step, the portion overlying and being in contact with the electrode; a power supply layer etching step of, after the plating step, etching away the power supply layer except for a portion that (is covered with the metal coating and) serves an extension to the electrode; and an insulating film-protecting resist-removing step of removing the resist after the power supply layer etching step.
priorityDate 2007-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6326954
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559532
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24404
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523132

Total number of triples: 21.