| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0277
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2008-09-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1037a749a7d25144305b690cd1dbda52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef495b5e6cf854901df6f4311a1deac0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fdddc13236fefbcf9433cab71261f27 |
| publicationDate |
2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200915003-A |
| titleOfInvention |
Positive photosensitive composition, pattern forming method using the same and resin used in the composition |
| abstract |
The present invention provides a positive photosensitive composition, a pattern forming method using the said positive photosensitive composition and a novel resin contained in the said positive photosensitive composition. The positive photosensitive composition has broad exposure latitude and is capable of controlling line-edge roughness (not only under usual exposure (dry exposure), but also immersion exposure). The positive photosensitive composition contains (A) a resin has specific lactone structure on side chain of which solubility in an alkali developer increases under an action of an acid; and (B) a compound generates acid by irradiating active light or radiation ray. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I501983-B |
| priorityDate |
2007-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |