| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D339-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-72 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2008-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5ff6c6e0a2b8514b393a61c7ddfc6a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_835f8da0099ce8ef207a206f0b32dcc2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61e0f503da1e61302d621d6ba0a2c77f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b06fcd6cdea97af9494daf1162705467
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d0178cd53167c806dbc7a13c2f2a346c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_053af871d1335648ab59a0629653e401 |
| publicationDate |
2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200914993-A |
| titleOfInvention |
Acid-amplifier having acetal group and photoresist composition including the same |
| abstract |
An acid-amplifier having an acetal group and a photoresist composition including the same, are disclosed. The acid-amplifier produces an acid (second acid) during a post-exposure-bake (PEB), which is induced by an acid (first acid) generated from a photo-acid generator (PAG) at the exposure process so that a line edge roughness (LER) of the photoresist pattern and photoresist energy sensitivity are improved. The acid-amplifier has a structure of following Formula 1. in Formula 1, R is C4 to C20 mono-cyclic or multi-cyclic saturated hydrocarbon, R1 is C1 to C10 linear hydrocarbon, C1 to C10 perfluoro compound or C5 to C20 aromatic compound, Ra and Rb are independently hydrogen atom or C1 to C4 saturated hydrocarbon and A is independently oxygen atom (O) or sulfur atom (S). |
| priorityDate |
2007-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |