| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2008-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d854df3dc77bf1ec260a6cc9ae3722b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_51f8f4129cad146e27dd7321b078fbfb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_db40fca061e5d0de74e48225a8b62379
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc3d03b244f6aa9198c362cdcde5349a |
| publicationDate |
2009-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200914590-A |
| titleOfInvention |
Polishing solution for metal and method of polishing film to be polished |
| abstract |
A polishing solution for metal is provided. The polishing solution for metal includes a metal oxide dissolving agent, a metal anticorrosive agent, poly acrylic polymer, a metal oxidant and water. The metal oxidant in the polishing solution is hydrogen peroxide, and the content of hydrogen peroxide is 12 to 30 mass% in proportion to the mass of the polishing solution for metal. The polishing solution for metal is capable of keeping a preferable polishing rate and accomplishing excellent planarity of the polished surface. A polishing method of polished film by using the polishing solution for metal is also provided. |
| priorityDate |
2007-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |