http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200912541-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B3-00 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2008-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc6a19055ab71bfe7066169b927fae8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b173804edfa358238298a8c8e9aa4305 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dbcc3476daace1cb9b871ec4a71a55b |
| publicationDate | 2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200912541-A |
| titleOfInvention | Photosensitive resin and production method of microlens |
| abstract | To provide a material for microlenses which has heat resistance, high resolution, and a high light-extraction efficiency. The material is a positive resist composition comprising: (A) an alkali-soluble polymer which comprises unit structures having an aromatic fused ring or a derivative thereof; and (B) a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. This positive resist composition gives a coating film having a refractive index as measured at a wavelength of 633 nm of 1.6 or higher and a transmittance as measured at a wavelength of 400-730 nm of 80% or higher. Also provided is a process for producing a microlens which comprises the step of applying the positive resist composition to a substrate and the steps of drying, exposing, and developing the composition applied. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I557141-B |
| priorityDate | 2007-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 253.