http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200912523-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-13
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-64
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-64
filingDate 2008-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_588775b475de1d4a18df27871bd5b9d0
publicationDate 2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200912523-A
titleOfInvention Pellicle frame
abstract To provide a superior pellicle frame in which frame distortion caused either by the tensile force of the pellicle film or during handling is suppressed, and distortion of the mask resulting from attachment of the pellicle is also suppressed. A pellicle frame used in semiconductor lithography, wherein the frame is formed by joining two or more materials having different moduli of elasticity. In preferred configurations, the frame is formed using a material having a modulus of elasticity of 10 GPa or less and a material having a modulus of elasticity of 50 GPa or more, a plurality of layers of the pellicle frame are joined in a direction perpendicular to the surface of the pellicle film, or the materials are layered such that the material with the smallest modulus of elasticity either forms the outermost layer or the innermost layer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I505020-B
priorityDate 2007-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419517688
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6594

Total number of triples: 15.