http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200912523-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-13 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-64 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-64 |
filingDate | 2008-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_588775b475de1d4a18df27871bd5b9d0 |
publicationDate | 2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-200912523-A |
titleOfInvention | Pellicle frame |
abstract | To provide a superior pellicle frame in which frame distortion caused either by the tensile force of the pellicle film or during handling is suppressed, and distortion of the mask resulting from attachment of the pellicle is also suppressed. A pellicle frame used in semiconductor lithography, wherein the frame is formed by joining two or more materials having different moduli of elasticity. In preferred configurations, the frame is formed using a material having a modulus of elasticity of 10 GPa or less and a material having a modulus of elasticity of 50 GPa or more, a plurality of layers of the pellicle frame are joined in a direction perpendicular to the surface of the pellicle film, or the materials are layered such that the material with the smallest modulus of elasticity either forms the outermost layer or the innermost layer. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I505020-B |
priorityDate | 2007-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Predicate | Subject |
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isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419517688 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6594 |
Total number of triples: 15.