http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200911893-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J5-14 |
| filingDate | 2008-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70e69a788219412d5d24de635f0d6131 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1b04078b4f3d5acb583f42822146897 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12a6c8253666dddbe4034ed3bf4e4321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff37d7ae5f5a9b8fb3f1085678217500 |
| publicationDate | 2009-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200911893-A |
| titleOfInvention | Polishing solution for metal film and polishing method |
| abstract | The present invention is a polishing solution for metal film. The polishing solution for metal film includes equal to or more than 7.0 wt% oxidant of metal when total amount of the polishing solution for metal film being 100 wt%, water-soluble polymer, metal oxide dissolving agent, metal anticorrosive agent and water. The weight average molecular weight of the water-soluble polymer is equal to or more than 150, 000, and the water-soluble polymer is selected from at least one of polycarboxylic acid, salt of polycarboxylic acid and polycarboxylic acid ester. The present invention is related to a polishing solution for metal film. Therefore, a polishing solution for metal film and a polishing method using the same are provided to fast polish at low polishing load of equal to or more than 1 psi, make a polished film having excellent flatness after polishing, and achieve high polishing rate from the beginning of polishing. |
| priorityDate | 2007-07-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 122.