| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
2008-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de362a6f4261fa964aa91f0cb9e9e0e0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c1a9a1895eb244027152660d1103ed8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_435d9c9b194a593797b0d757710778ec
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3d6af8dd7c0cc87e9165369a4681065f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f110e0e7102931afe7edfc0254e94e54 |
| publicationDate |
2009-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200907576-A |
| titleOfInvention |
Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method |
| abstract |
A pattern forming method includes (a) coating a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I411892-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9760003-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I488006-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I418933-B |
| priorityDate |
2007-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |