| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cf213be03285a0b93967ae2fd2fd351a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-121
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-123 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2008-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38d1e3a389e99c2bf9f4008e8b56916e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93ef73282fccd1e7f3325d0e540b6114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d75ce486e47ddfb7b761ac8139ef406
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d52a7eff0676f1b28227625c137a61a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39ac16f8a1ca2e7606a5436f06c671c7 |
| publicationDate |
2009-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200907565-A |
| titleOfInvention |
Photoresist composition and method of forming a photoresist pattern using the same |
| abstract |
A photoresist composition comprises about 0. 5 to about 20 parts by weight of a photo-acid generator, about 10 to about 70 parts by weight of a novolac resin containing a hydroxyl group, about 1 to about 40 parts by weight of a cross-linker that comprises an alkoxymethylmelamine compound, and about 10 to about 150 parts by weight of a solvent. |
| priorityDate |
2007-04-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |