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filingDate 2008-05-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2009-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200906722-A
titleOfInvention Method and equipment for direct chlorination of metallurgical grade silicon
abstract Method and equipment for the direct chlorination of metallurgical grade silicon to produce silicon tetra chloride, including a reactor with means for the supply of silicon and injection of chlorine and means for the removal of the reaction product, silicon tetra chloride and any remnant material. The chlorination takes place in a disappearing bed reactor where the reactor is of the vertical tube shape type and where the silicon is fed continuously from the top of the reactor and chlorine is injected co-currently or counter-currently with the silicon in a controlled manner and whereby simultaneously heat generated under the reaction is rejected to maintain the reaction temperature preferably between 300-700DEG C. The invention provides a cheap, effective and easily controllable method and equipment for production of the subject product.
priorityDate 2007-05-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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