| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-06 |
| filingDate |
2008-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_45fadea9efd76043621af4151c2bf8f7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85ea68b291e52b28734617ceeda3a4fa |
| publicationDate |
2009-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200905725-A |
| titleOfInvention |
Methods for forming a ruthenium-based film on a substrate |
| abstract |
Methods for forming a film on a substrate in a semiconductor manufacturing process. A reaction chamber and a substrate in the chamber are provided. A ruthenium based precursor, which includes ruthenium tetroxide dissolved in a mixture of at least two non-flammable fluorinated solvents, is provided and a ruthenium containing film is produced on the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11685991-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I806965-B |
| priorityDate |
2007-02-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |