| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-725
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-423 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2008-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5117df5323734ea44e6f5d31d94aca51 |
| publicationDate |
2009-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200905420-A |
| titleOfInvention |
Particle-containing resist peeling liquid and peeling method by using it |
| abstract |
The purpose of the present invention provides a resist peeling liquid with excellent peeling property. Further, provide is a resist peeling method having great peeling property and circuit will not be injured. The solution of the present invention is a resist peeling liquid having excellent peeling property, which comprises particles with primary particle diameter of 5 to 1,000 nm and at least one of compound selected from the group consisting of amine compound and alkylene glycols; and also a resist peeling method by using the said resist peeling liquid which does not comprise the step of ashing treatment, have excellent peeling property and do not injure the circuit structure. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105017973-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108508712-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105017973-A |
| priorityDate |
2007-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |