| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9a00e7745478e8b2a517a78d37ab0830 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34 |
| filingDate |
2007-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9491c516f57fdf4efc736f1e67c75a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7251af6c1fbd5651f9914919bb06c3a9 |
| publicationDate |
2009-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200900135-A |
| titleOfInvention |
Gas processing apparatus |
| abstract |
A gas processing apparatus of high versatility that ensures easy management and low maintenance frequency, and that is capable of processing a wide variety of processing object gases emitted from industrial processes, such as semiconductor manufacturing process. There is provided gas processing apparatus (10) equipped with reactor (12) surrounding atmospheric pressure plasma (P) and processing object gas (F) fed toward atmospheric pressure plasma (P), adapted to perform pyrolysis of the processing object gas (F) there inside, characterized in that the reactor (12) is fitted with water supply means (16) for covering the internal surface thereof with water (W). By this construction, so-known "wet wall" is provided on approximately the whole of the internal surface of the reactor (12). Thus, there can be attained not only prevention of sticking/accumulation resulting from contact of solid components of the processing object gas (F) with the internal surface of the reactor (12) but also retardation of deterioration of the internal surface. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I554326-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I563117-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9259679-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I581827-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9512518-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10227926-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I639800-B |
| priorityDate |
2007-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |