http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200849382-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88fc7f9eb617072238851d46591a0c76 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31 |
| filingDate | 2007-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b5a2a95bdc8a374b59cce9c70c5ad50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63ee079b78b7bcac3dec64538bd6a9d9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c99e82926c1bc132cba0b602b80c28d1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2799879c79f2b50e5243832b7fa395a1 |
| publicationDate | 2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200849382-A |
| titleOfInvention | Method and apparatus for fabricating high tensile stress film |
| abstract | A method and an apparatus for fabricating a high tensile stress film includes providing a substrate having at least a transistor formed thereon, forming a poly stressor on the substrate, and performing an ultra violet rapid thermal process (UVRTP) for curing the poly stressor and adjusting its tensile-stress status, thus the poly stressor serves as a high tensile stress film. Due to the combination of energy from photon and heat, the poly stressor is adjusted in a relatively shorter process period. |
| priorityDate | 2007-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.