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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1d0f1017720e6880fec1ae3c67b21a6
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publicationDate 2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200848922-A
titleOfInvention Nano-imprinting process
abstract A nano-imprinting process is described, comprising: providing a substrate including an imprinting material layer covering on a surface of the substrate; providing a mold including a plurality of protruding features set on a surface of the mold, wherein the surface of the mold is covered with an anti-stick layer; forming a transferring material layer on a top surface of each protruding feature; pressing the surface of the mold into the imprinting material layer to make the transferring material layer embed in a first portion of the imprinting material layer; removing the mold and separating the mold and the transferring material layer simultaneously to transfer the transferring material layer into the first portion of the imprinting material layer and to expose a second portion of the imprinting material layer; using the transferring material layer as a mask and removing the second portion of the imprinting material layer and a portion of the substrate; and removing the first portion of the imprinting material layer and the transferring material layer.
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