http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200848774-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_794eda73db2ae4fcdc47a33837e351f6 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K3-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24421 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-11 |
| filingDate | 2007-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_03c788c157c3b391746249ff9066a0a4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9da7308f1a1d3373917834457fa86513 |
| publicationDate | 2008-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200848774-A |
| titleOfInvention | Low reflection film and forming method |
| abstract | A low reflection film and a low reflection film forming method. The low reflection film includes at least one alkoxyl resin and plural silicon dioxide particles. The alkoxyl resin has at least two alkoxyl groups. The silicon dioxide particles are fixed by the alkoxyl resin. The silicon dioxide particles are exserted from the surface of the alkoxyl resin. The steps of the method include adding a first solvent into a solution mixed with a catalyst and the alkoxyl resin after a sol-gel reaction to prepare a first solution, mixing plural silicon dioxide particles with the first solution to prepare a second solution, coating the second solution on a surface, and proceeding a drying process to form the low reflection film. |
| priorityDate | 2007-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 149.