| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02255
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67109
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28202 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-318 |
| filingDate |
2007-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7e563d5424902dbceec74098b4e401a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_683fc3897a5824ff354086314957763d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ff0d7ceea75de309c87dbf6ca3ebfad |
| publicationDate |
2008-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200847281-A |
| titleOfInvention |
Method for forming insulating film and method for manufacturing semiconductor device |
| abstract |
A method for forming an insulating film includes a step of preparing a substrate, which is to be processed and has silicon exposed on the surface; a step of performing first nitriding to the silicon exposed on the surface of the substrate, and forming a silicon nitride film having a thickness of 0.2 nm but not more than 1nm on the surface of the substrate; and a step of performing first heat treatment to the silicon nitride film in N2O atmosphere and forming a silicon nitride film. This method may further include a step of performing second nitriding to the silicon oxynitride film, and furthermore, may include a step of performing second heat treatment to the silicon oxynitride film after the second nitriding. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10121683-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10790171-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I707402-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I755840-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10978319-B2 |
| priorityDate |
2006-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |