| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_78192e1eeeb45b9db579a60052632a8b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-546
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02532
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C4-134
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-182
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-205 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-34 |
| filingDate |
2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_249a58fcbfc6bfd7cc8e73b5fe7830bf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d7a5ce59a30627bc1718d59191bab53 |
| publicationDate |
2008-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200845832-A |
| titleOfInvention |
Plasma spraying of semiconductor grade silicon |
| abstract |
A plasma spray gun (10) configured to spray semiconductor grade silicon to form semiconductor structures including p-n junctions includes parts such as the cathode (16) or anode (20) or other parts facing the plasma or carrying the silicon powder having at least surface portions formed of high purity silicon. The semiconductor dopant may be included in the sprayed silicon. |
| priorityDate |
2007-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |