http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200845306-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b2d32a1324eb3a240649ffee8d475d63
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8242
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768
filingDate 2007-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5ab9013ca8346a7fce2a850a45f31e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37660544ea1c79c0f38175e0fd59f9c9
publicationDate 2008-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200845306-A
titleOfInvention Method for forming a semiconductor structure
abstract The present invention provides a method for forming a semiconductor structure. The method includes providing a substrate, forming a insulating layer on the substrate, forming a silicon mask layer on the insulating layer, forming at least one contact opening to expose a portion of the substrate. An ion implantation process is performed to the contact opening. Next, a thermal oxidation process is performed to form a first oxide layer on the silicon mask layer and a second oxide layer on the exposed portion of the substrate within the contact opening. The thickness of the first oxide layer is thicker than that of the second oxide layer. Then, the second oxide layer is removed, and at least of a portion of the first oxide layer is remained on the substrate. A barrier layer is then formed on the sidewall of the contact opening, and a metal layer is formed over the barrier layer.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107873107-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107873107-B
priorityDate 2007-05-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23963
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578752
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6517
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID93091
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419555680
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415776246
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID82912
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425762086
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523132
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID411288572
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559477
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6326954
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23964
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559362
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426

Total number of triples: 35.