| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8cf8d77ac0eff1767b22d2fb9445b64d |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32862
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B3-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate |
2008-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2788d5a2f7878e5f69c215ab491cc3e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4d4efb466fa2c02b8be3289f70ce1520
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5560a5b524136698539c9a8fe4534390
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef86f5c96483a8d2581aae3b4058e0c1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d5b00139394db56c0f11b3504b46f389
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44beb4e9bb8320caa3e0e6985c7dfe19 |
| publicationDate |
2008-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200845181-A |
| titleOfInvention |
Cleaning of bonded silicon electrodes |
| abstract |
Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon member with a plasma-exposed silicon surface, a backing member, and an elastomer bonding material between the silicon surface and the backing member. |
| priorityDate |
2007-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |