| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3212 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate |
2008-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_957ef0b677d29ee7a61ef8c0af8d1d30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_185a59569550cc953146c98b8101ca54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9259ed7780be1cec8d9675f6f1eca81d |
| publicationDate |
2008-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-200845175-A |
| titleOfInvention |
Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing method, and method for manufacturing semiconductor device |
| abstract |
Disclosed is an aqueous dispersion for chemical mechanical polishing, which contains (A) a water-soluble polymer having at least one group selected from amino groups and cationic functional groups in a side chain, (B) an oxidizing agent, (C) at least one compound other than the component (A) which is selected from amino acids, organic acids and inorganic acids, and (D) abrasive grains. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I412582-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I460777-B |
| priorityDate |
2007-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |