http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200837212-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
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filingDate 2007-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_495b6be1c2fb0b81d916b8ab14218638
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6915b13916a963a02df7f9ce86b49771
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publicationDate 2008-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200837212-A
titleOfInvention Technique for atomic layer deposition
abstract A technique for atomic layer deposition is disclosed. In one particular exemplary embodiment, the technique may be realized by an apparatus for atomic layer deposition. The apparatus may comprise a process chamber having a substrate platform to hold at least one substrate. The apparatus may also comprise a supply of a precursor substance, wherein the precursor substance comprises atoms of at least one first species and atoms of at least one second species, and wherein the supply provides the precursor substance to saturate a surface of the at least one substrate. The apparatus may further comprise a plasma source of metastable atoms of at least one third species, wherein the metabstable atoms are capable of desorbing the atoms of the at least one second species from the saturated surface of the at least one substrate to form one or more atomic layers of the at least one first species.
priorityDate 2007-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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