Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c4d6382ca21f570fe9fbddf304686780 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0892 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0828 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-083 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02C20-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0875 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J2219-0896 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-2066 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-8662 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-245 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-8659 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J19-088 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05H1-2431 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-86 |
filingDate |
2007-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eee7b45ab1f9a50f966a96d0fae361a4 |
publicationDate |
2008-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-200829327-A |
titleOfInvention |
Apparatus for treating a gas stream |
abstract |
Apparatus for treating a gas stream comprises a nonthermal plasma reactor, for example a dielectric barrier discharge plasma reactor, containing a silicon-containing solid for reacting with a halogen-containing component of the gas stream to form a gaseous silicon halide. A sorbent bed of material chosen to react with the silicon halide to form inorganic halides is located downstream from the plasma reactor. A similar bed of material is located upstream from the plasma reactor to remove silicon halide and other acid gas components from the gas stream before it enters the plasma reactor. |
priorityDate |
2006-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |