http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200827048-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6ac179bcbad17b8ea0260c65f201da92 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B3-12 |
| filingDate | 2007-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4369437dfd6649da6e7287af5b9c4f20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_78418b8d90653bae32fcb570b6b99002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c58fcf7024db1ebad7ce25e93df945de |
| publicationDate | 2008-07-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200827048-A |
| titleOfInvention | Cleaning liquid and cleaning method for electronic material |
| abstract | The present invention relates to a cleaning liquid for an electronic material, particularly, a silicon wafer and a cleaning method using the same. The cleaning method according to the present invention is characterized by using ultra-pure water or hydrogen water as raw material water and uses the cleaning liquid in combination with ultrasonic irradiation under presence of hydrogen micro-bubbles. The method of the present invention enables efficient cleaning and removal of particle components and the like on the wafer surface and prevention of re-contamination. |
| priorityDate | 2006-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 40.