http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200823310-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_75b765b53e6651e9863a3a35e4c1e164 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 |
| filingDate | 2006-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_38a73088215014fd6b439ee44ac9a7e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e12557dbad2fdddd0ec3a48dc4f4451 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d6718fc3b0e40ebfc7118a88ab730e63 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14d90afffe3474ef6ed23ed2c5f0c7c3 |
| publicationDate | 2008-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-200823310-A |
| titleOfInvention | Method for producing a dielectric film with uniform thickness |
| abstract | This invention provides a method for producing a dielectric film with uniform thickness, which comprises (a) introducing a surface modifier of gaseous molecule containing oxygen atoms or nitrogen atoms, (b) ionizing the surface modifier to form a compound film on a surface of a substrate with lone-pair electron in out-shell orbit, and (c) forming a dielectric film of metallic compound on the compound film. The substrate is selected from M or silicide containing M. M is selected from Pt, Ni, Pd, Cu, Ag, Au, and a combination thereof. |
| priorityDate | 2006-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 56.