http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-200822191-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
filingDate 2007-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22b07a96dacece8e1165b89fa20a777e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99fc56ed5810f76812469fb53bee2262
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publicationDate 2008-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200822191-A
titleOfInvention Precursors and hardware for CVD and ALD
abstract The present invention generally comprises an apparatus for depositing high k dielectric or metal gate materials in which toxic, flammable, or pyrophoric precursors may be used. Exhaust conduits may be placed on the liquid precursor or solid precursor delivery cabinet, the gas panel, and the water vapor generator area. The exhaust conduits permit a technician to access the apparatus without undue exposure to toxic, pyrophoric, or flammable gases that may collect within the liquid deliver cabinet, gas panel, and water vapor generator area.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9640393-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9443924-B2
priorityDate 2006-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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