Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_31b1220216408a6076f55e0ba4ec1003 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2033-0095 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-302 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
filingDate |
2007-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de104459d8a32e087643e574ddf16e26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d59489d54cab6ea539a1cfcfa0aed825 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf3c42e2d1318288fc7d6e7868216011 |
publicationDate |
2008-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-200819519-A |
titleOfInvention |
Methods for characterizing defects on silicon surfaces, etching composition for silicon surfaces and process of treating silicon surfaces with the etching composition |
abstract |
The present invention relates to a method for characterizing defects on silicon surfaces, in particular silicon wafers, a method for treating silicon surfaces with an etching solution and the etching solution to be employed in the method and process of the present invention. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102449112-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102449112-A |
priorityDate |
2006-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |