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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02602d7bf4a6b83c0a7c1feabedae8f0
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publicationDate 2008-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-200815924-A
titleOfInvention Resist cover film forming material, resist pattern forming method, and electronic device and method for manufacturing the same
abstract To provide a material including: a silicon-containing polymer having at least an alkali-soluble group and is represented by the following general formula (1); and an organic solvent capable of dissolving the silicon-containing polymer. (SiO4/2)a(R1tSiO(4-t)/2)b(O1/2R2)c general formula (1), where R1 represents at least one of a monovalent organic group, hydrogen atom and hydroxyl group, R2 represents at least one of a monovalent organic group and hydrogen atom (where R1 and R2 each may appear twice or more, and at least one of R1 and R2 contains an alkali-soluble group), "t" represents an integer of 1 to 3, "a," "b," and "c" represent the relative proportions of their units (where a ≥ 0, b ≥ 0 and c ≥ 0, and "a," "b," and "c" are not 0 at the same time), and (R1tSiO(4-t)/2)b may appear twice or more.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I784884-B
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