| abstract |
Provided is a composition which has excellent properties of anyone of photo-curing, adhesive, film-remaining, pattern sharp, coating characteristic (I), coating characteristic (II) and etching suitability. The solution mean of the present invention is a photo-curing composition comprising (a) polymerization compound, (b) 0.1 to 15% by mass of photo polymerization initiator and/or photo acid generator, (c) 0.001 to 5% by mass of anyone of fluorine-based surfactant, silicone-based surfactant and fluorine-silicone-based surfactant; and (d) the viscosity at 25 DEG C is the range of 3 to 18 mPa.s. The said (a) polymerization compound comprises each 50% by mass or more of (e) polymerization unsatisfied monomer which has 4.0 or less of primary skin stimulative (PII value), and (f) polymerization unsatisfied monomer which has 30 mPa.s or less of viscosity at 25 DEG C (wherein, part of whole of the said (e) polymerization unsatisfied monomer and (f) polymerization unsatisfied monomer also could be the same polymerization unsatisfied monomer). |